Microstructural Analysis at Metal/Semiconductor Interface for Ideal Ohmic Contacts

• Murakami Masanori

  Department of Materials Science and Engineering, Kyoto University

• Koide Yasuo

  Department of Materials Science and Engineering, Kyoto University

• Oku Takeo

  nstitute of Scientific and Industrial Research, Osaka University

Bibliographic Information

Other Title

• 金属・半導体界面反応層の微細構造と電気特性

Journal

• Materia Japan

  Materia Japan 37 (12), 998-998, 1998

  The Japan Institute of Metals and Materials

Keywords

• ohmic contacts
• electrical properties
• metal/semiconductor imterface

Details

• CRID: 1390282679056245248
• NII Article ID: 10002546718
• NII Book ID: AN10433227
• DOI: 10.2320/materia.37.998
• ISSN: 18845843
• ISSN: 13402625
• Web Site: https://www.jstage.jst.go.jp/article/materia1994/37/12/37_12_998/_pdf
• Data Source:
  • JaLC
  • Crossref
  • CiNii Articles