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- SAEKI Isao
- Division of Material Science and Engineering, Graduate School of Engineering, Hokkaido University
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- SETAKA Jun
- Division of Material Science and Engineering, Graduate School of Engineering, Hokkaido University
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- FURUICHI Ryusaburo
- Division of Material Science and Engineering, Graduate School of Engineering, Hokkaido University
書誌事項
- タイトル別名
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- Preventing Photoelectrochemical Corrosion of ZnO by Ti Inclusions
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抄録
<p>Zinc oxide films containing small amounts of Ti oxide were prepared by heat treatment of Ti sheets with a Zn plated overlayer. Long term photoelectrochemical corrosion tests of the film at a constant potential of 1 V vs. Ag | AgCl was carried out. It was found that Zn2+ ions initially dissolved into the electrolyte solution but that dissolution then stopped. This behavior can be explained by an increase in the surface concentration of Ti. After some dissolution of Zn, the increased Ti concentration enables the surface to withstand further photoelectrochemical corrosion. This Ti containing oxide film showed a much better photoresponse than that of Ti oxide alone in the long wavelength region and would be a good candidate for photo anodes in aqueous electrolytes.</p>
収録刊行物
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- Electrochemistry
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Electrochemistry 67 (7), 760-764, 1999-07-05
公益社団法人 電気化学会
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キーワード
詳細情報 詳細情報について
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- CRID
- 1390001277393221376
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- NII論文ID
- 10002567919
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- NII書誌ID
- AN00151637
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- ISSN
- 21862451
- 13443542
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- NDL書誌ID
- 4786365
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用可