Characterization of Atomically Smooth Al Films by Transmission Electron Microscopy and Atmoimc Force Microscopy

この論文にアクセスする

この論文をさがす

著者

    • LU X.
    • Department of Applied Chemistry and Chemical Engineering, Faculty of Engineering, Kagoshima University
    • MAZUR U.
    • Department of Applied Chemistry and Chemical Engineering, Faculty of Engineering, Kagoshima University
    • HIPPS K. W.
    • Department of Applied Chemistry and Chemical Engineering, Faculty of Engineering, Kagoshima University

抄録

Atomically smooth Al films were prepared by vacuum evaporation on heated mica substrates at 350°C. The films consist of single crystals 270 nm in diameter with (111) faces and the crystals are oriented randomly about the [111] direction which is perpendicular to the substrate. The roughness of the Al film surfaces is 0.6 nm over 1 × 1 μm areas.

収録刊行物

  • Chemistry letters  

    Chemistry letters 1997(8), 709-710, 1997-08 

    The Chemical Society of Japan

参考文献:  5件

参考文献を見るにはログインが必要です。ユーザIDをお持ちでない方は新規登録してください。

各種コード

  • NII論文ID(NAID)
    10002613496
  • NII書誌ID(NCID)
    AA00603318
  • 本文言語コード
    ENG
  • 資料種別
    ART
  • ISSN
    03667022
  • データ提供元
    CJP書誌  J-STAGE 
ページトップへ