Novel Concurrent Formation of Mo-Si and Si-C Bonds by the Reaction between [MoH_4(Ph_2PCH_2CH_2PPh_2)_2] and PhSiH_3

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著者

    • ZHOU Da-Yang
    • Department of Materials Chemistry, Faculty of Engineering, Yokohama National University
    • MINATO Makoto
    • Department of Materials Chemistry, Faculty of Engineering, Yokohama National University
    • ITO Takashi
    • Department of Materials Chemistry, Faculty of Engineering, Yokohama National University

抄録

Reaction of [MoH<SUB>4</SUB>(Ph<SUB>2</SUB>PCH<SUB>2</SUB>CH<SUB>2</SUB>PPh<SUB>2</SUB>)<SUB>2</SUB>] with PhSiH<SUB>3</SUB> in refluxing toluene yielded doubly chelated novel complexes with the Si–C–C–P–Mo framework as a result of the oxidative addition involving Si–H bond cleavage concurrent with the selective activation of the ortho C–H bonds of the dppe ligands.

収録刊行物

  • Chemistry letters

    Chemistry letters 1997(10), 1017-1018, 1997-10

    The Chemical Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002615759
  • NII書誌ID(NCID)
    AA00603318
  • 本文言語コード
    ENG
  • 資料種別
    ART
  • ISSN
    03667022
  • データ提供元
    CJP書誌  J-STAGE 
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