In-situ observation of electrical resistivity of Cu and Al thin films grown by sputtering and EB evaporation

• KUBOTA H.

  Faculty of Engineering, Tohoku University

• SATO H.

  Faculty of Engineering, Tohoku University

• MIYAZAKI T.

  Faculty of Engineering, Tohoku University

Bibliographic Information

Other Title

• スパッタ法及びEB蒸着法で作製したCu, Al薄膜の成長過程における電気抵抗の変化

Journal

• 日本応用磁気学会学術講演概要集 = Digest of ... annual conference on magnetics in Japan

  日本応用磁気学会学術講演概要集 = Digest of ... annual conference on magnetics in Japan 19 514-, 1995-09-01

Details

• CRID: 1570009749159677440
• NII Article ID: 10002647248
• NII Book ID: AN10269644
• Text Lang: ja
• Data Source:
  • CiNii Articles