流動層CVD法によるSi_3N_4微粒子のAlN被覆 Coating of Si_3N_4 Fine Particles with AlN by Fluidized Bed-CVD
Agglomerates of 100250 μm consisting of Si<SUB>3</SUB>N<SUB>4</SUB> primary particles of 0.76 μm were made with a rotary vibrating sieve. Si<SUB>3</SUB>N<SUB>4</SUB> fine particles were coated with AlN by gas phase reaction with AlCl<SUB>3</SUB> and NH<SUB>3</SUB> in some fluidized beds of the agglomerates. The cross sectional distribution of AlN in the agglomerate was measured by EPMA analysis. As a result, uniform deposition of AlN was obtained at a relatively low reaction temperature and low gas velocity.
化学工学論文集 22(2), 412-415, 1996-03-10
The Society of Chemical Engineers, Japan