書誌事項
- タイトル別名
-
- Visualization of Scattering Mist by Si Wafer Substrates Spin Cleaning
- キバン スピン センジョウ ニ オケル ヒサン ミスト ノ カシカ
この論文をさがす
抄録
The scattering mist single plate spin cleaning process used in the manufacture of semi-conductors and liquid crystal displays, causes a rebound into the substrate during the spin cleaning process, resulting in re-pollution. It is therefore extremely important for scattering mist control to improve cleaning performance in the development of the single plate spin cleaner. The behaviour from substrate to scattering mist during the spin process is made visible with the laser light sheet method. This simplifies investigations into the form of the device and cleaning process conditions. The scattering mist within the spin cup for all cleaning processing conditions is visible with the use of a compact Laser particles visualization system. By comparing the visible pixels and the particles adhering to substrate surfaces, the authors examined the visibility technology application in the development of a single plate spin cleaner.
収録刊行物
-
- 可視化情報学会誌
-
可視化情報学会誌 16 (Supplement2), 15-18, 1996
社団法人 可視化情報学会
- Tweet
詳細情報 詳細情報について
-
- CRID
- 1390282679597425536
-
- NII論文ID
- 10002674278
- 130003648579
-
- NII書誌ID
- AN10374478
-
- ISSN
- 1884037X
- 09164731
-
- NDL書誌ID
- 4056000
-
- 本文言語コード
- ja
-
- データソース種別
-
- JaLC
- NDL
- Crossref
- CiNii Articles
-
- 抄録ライセンスフラグ
- 使用不可