de Haas-van Alphen Effect of Strongly Correlated f-Electron Systems under Pressure

この論文にアクセスする

この論文をさがす

著者

    • TERASHIMA T.
    • Tsukuba Magnet Laboratory, National Research Institute for Metals
    • UJI S.
    • Tsukuba Magnet Laboratory, National Research Institute for Metals
    • TERAKURA C.
    • Tsukuba Magnet Laboratory, National Research Institute for Metals
    • MATSUMOTO T.
    • Tsukuba Magnet Laboratory, National Research Institute for Metals
    • UESAWA A.
    • Physics Department, Graduate School of Science, Tohoku University
    • SUZUKI T.
    • Physics Department, Graduate School of Science, Tohoku University
    • SATO N.
    • Physics Department, Graduate School of Science, Tohoku University
    • KUNII S.
    • Physics Department, Graduate School of Science, Tohoku University
    • NISHIGAKI T.
    • Department of Physics, Faculty of Science, Tokyo Metropolitan University
    • SUGAWARA H.
    • Department of Physics, Faculty of Science, Tokyo Metropolitan University
    • AOKI Y.
    • Department of Physics, Faculty of Science, Tokyo Metropolitan University
    • SATO H.
    • Department of Physics, Faculty of Science, Tokyo Metropolitan University

抄録

We have studied the de Haas-van Alphen (dHvA) effect under pressure for some typical compounds of strongly correlated Ce compounds CeSb, CeB<SUB>6</SUB>, CeRu<SUB>2</SUB>Si<SUB>2</SUB>, CeRu<SUB>2</SUB>Ge<SUB>2</SUB> and CeCo<SUB>2</SUB>. The pressure dependence of the dHvA frequencies is much larger than that expected from compressibility or that of normal metals. The pressure dependence of the effective masses have been measured in CeSb and CeB<SUB>6</SUB>, and it is difficult to explain that in terms of the increase of mixing with pressure.

収録刊行物

  • 高圧力の科学と技術 = The Review of high pressure science and technology  

    高圧力の科学と技術 = The Review of high pressure science and technology 7, 456-458, 1998 

    The Japan Society of High Pressure Science and Technology

参考文献:  23件

参考文献を見るにはログインが必要です。ユーザIDをお持ちでない方は新規登録してください。

各種コード

  • NII論文ID(NAID)
    10002690557
  • NII書誌ID(NCID)
    AN10452913
  • 本文言語コード
    ENG
  • 資料種別
    ART
  • ISSN
    0917639X
  • NDL 記事登録ID
    4493950
  • NDL 雑誌分類
    ZP1(科学技術--化学・化学工業)
  • NDL 請求記号
    Z17-1589
  • データ提供元
    CJP書誌  NDL  J-STAGE 
ページトップへ