High Pressure Apparatus for in situ X-ray Diffraction and Electrical Resistance Measurement at Low Temperature
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A new high pressure apparatus with cubic anvil device has been developed to carry out simultaneously X-ray diffraction and electrical resistance measurement up to 10 GPa at low temperature down to 7 K. This apparatus consists mainly of a uniaxial press for pressure generation, an X-ray diffraction system with an energy dispersive detector, and a cryostat. Some experimental results of the simultaneous measurements obtained by using this apparatus are also reported.
- The Review of High Pressure Science and Technology
The Review of High Pressure Science and Technology 7, 1496-1498, 1998
The Japan Society of High Pressure Science and Technology