High Pressure Apparatus for in situ X-ray Diffraction and Electrical Resistance Measurement at Low Temperature.

• Tang J.

  National Research Institute for Metals

• Matsumoto T.

  National Research Institute for Metals

• Môri N.

  Institute for Solid State Physics, University of Tokyo

Bibliographic Information

Other Title

• High Pressure Apparatus for in situ X -

Abstract

A new high pressure apparatus with cubic anvil device has been developed to carry out simultaneously X-ray diffraction and electrical resistance measurement up to 10 GPa at low temperature down to 7 K. This apparatus consists mainly of a uniaxial press for pressure generation, an X-ray diffraction system with an energy dispersive detector, and a cryostat. Some experimental results of the simultaneous measurements obtained by using this apparatus are also reported.

Journal

• The Review of High Pressure Science and Technology

  The Review of High Pressure Science and Technology 7 1496-1498, 1998

  The Japan Society of High Pressure Science and Technology

Keywords

• high pressure apparatus
• transport property
• X-ray diffraction

Details

• CRID: 1390001204380586880
• NII Article ID: 10002694487
• NII Book ID: AN10452913
• DOI: 10.4131/jshpreview.7.1496
• ISSN: 13481940
• ISSN: 0917639X
• NDL BIB ID: 4494279
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4494279
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed