New Technique to In situ Control Oxygen Fugacity in Water-free High Pressure System

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抄録

Through inserting an oxygen-specific electrolyte disc inside and exerting a DC (direct current) voltage outside between the sample and an oxygen buffer, oxygen can be poured into or pumped from the sample at a fixed temperature and pressure. By measurement of the voltage between the sample and a reference buffer, the oxygen fugacity in the sample is simultaneously monitored. Therefore, the oxygen fugacity in the sample at high temperature and high pressure can be willfully and in situ adjusted and controlled independently of temperature and pressure.

収録刊行物

  • 高圧力の科学と技術 = The Review of high pressure science and technology  

    高圧力の科学と技術 = The Review of high pressure science and technology 7, 1523-1525, 1998 

    The Japan Society of High Pressure Science and Technology

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各種コード

  • NII論文ID(NAID)
    10002694561
  • NII書誌ID(NCID)
    AN10452913
  • 本文言語コード
    ENG
  • 資料種別
    ART
  • ISSN
    0917639X
  • NDL 記事登録ID
    4494287
  • NDL 雑誌分類
    ZP1(科学技術--化学・化学工業)
  • NDL 請求記号
    Z17-1589
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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