Siウエハ表面における有機ガスの吸着機構 Adsorption Mechanisms of Organic Compounds on Si Wafer Surfaces

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This study investigated organic compounds in a cleanroom air and on silicon (Si) wafer surfaces using gas chromatograph-mass spectroscopy (GC-MS) and thermal desorption-atmospheric pressure ionization mass spectroscopy (TD-APIMS). Si wafers with hydrogen terminate and with native oxygen exposed in the cleanroom air were analyzed. As an analytical result using TD-APIMS, chained hydrocarbons such as C<SUB>2</SUB>-C<SUB>5</SUB> alkanes were detected with higher values than phthalates such as DOP and DBP from Si wafers with hydrogen terminate and with native oxygen exposed in the cleanroom air. The adsorption mechanisms of organic compounds on Si wafers were discussed by thermal desorption spectra. Based on these results, the adsorption hierarchy model of organic compounds on Si wafer surfaces was proposed.

収録刊行物

  • エアロゾル研究 = Journal of aerosol research

    エアロゾル研究 = Journal of aerosol research 13(2), 142-148, 1998-06-20

    日本エアロゾル学会

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各種コード

  • NII論文ID(NAID)
    10002783027
  • NII書誌ID(NCID)
    AN10041511
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09122834
  • NDL 記事登録ID
    4512514
  • NDL 雑誌分類
    ZP5(科学技術--化学・化学工業--化学工学)
  • NDL 請求記号
    Z17-1062
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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