A Deposition Model of Ultra Thin Plasma Polymerized Acethylene Films by Pulsed RF Discharge

• Senda K.

  Nagoya University

• Vinogradov G. K.

  Nagoya University

• Morita S.

  Nagoya University

Bibliographic Information

Other Title

• パルス化RF放電によるプラズマ重合アセチレン超薄膜の生成モデル
• パルスカ RF ホウデン ニヨル プラズマ ジュウゴウ アセチレン チョウ ハ

Abstract

Plasma polymerization by using a pulsed rf discharge was performed for preparation of ultra thin organic film. The discharge capacitively coupled was initiated in a box-type reactor at an uniform flow of an acetylene/argon mixture gas. 2-10 nm scale ultra thin hydrocarbon film was deposited on a silicon wafer. The surface topography of the film examined by AFM appears to be pinhole free. The distribution of thickness measured by an elipsometer suggested the reaction in gas phase is significant. Therefore, the theoretical calculation was performed by using a model of radical reaction in the gas phase, and the obtained equations were fitted well to the results of experiments.

Journal

• IEEJ Transactions on Fundamentals and Materials

  IEEJ Transactions on Fundamentals and Materials 116 (1), 24-29, 1996

  The Institute of Electrical Engineers of Japan

Keywords

• プラズマ重合
• RFパルス放電
• アセチレン重合
• 有機超薄膜
• モデル計算

Details

• CRID: 1390282679575870208
• NII Article ID: 10002818717
• NII Book ID: AN10136312
• DOI: 10.1541/ieejfms1990.116.1_24
• ISSN: 13475533
• ISSN: 03854205
• NDL BIB ID: 3911875
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I3911875
• Web Site: https://www.jstage.jst.go.jp/article/ieejfms1990/116/1/116_1_24/_pdf
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed