Evaluation of Characteristics of BaTiO₃ Thin Films prepared by Intense, Pulsed, Ion-Beam Evaporation

• Sonegawa Tomihiro

  Nagaoka University of Technology

• Masugata Katsumi

  Nagaoka University of Technology

• Grigoriu Constantin

  Nagaoka University of Technology

• Yatsui Kiyoshi

  Nagaoka University of Technology

• Shimotori Yutaka

  Nippon Seiki Co.

• Furuuchi Sigemasa

  Nippon Seiki Co.

• Yamamoto Hiroshi

  Nichicon Co.

Bibliographic Information

Other Title

• 大強度パルスイオンビーム蒸着法で生成されたBaTiO₃薄膜の特性評価
• 大強度パルスイオンビーム蒸着法で生成されたBaTiO3薄膜の特性評価
• ダイキョウド パルス イオン ビーム ジョウチャクホウ デ セイセイサレタ B

Abstract

Cubic barium titanate (BaTiO₃) thin films have been successfully prepared in situ on the substrate of Al/SiO₂/Si(100) or SiO₂/Si(100) by intense, pulsed, ion-beam evaporation technique without heating the substrate. The energy of the ion beam used was typically 1.3 MeV with the power density of 0.6GW/cm². The deposition rate was observed to be 0.6μm/shot on the substrate placed at the distance, 4cm, from the target. The films prepared were cubic polycrystals and the composition are equivalent to that of the target. The specific dielectric constant was typically observed to be 40 at 1kHz. Relaxation time of dielectric palarization was found to distribute ln the range of 0.3-0.0003s.

Journal

• IEEJ Transactions on Fundamentals and Materials

  IEEJ Transactions on Fundamentals and Materials 116 (8), 738-743, 1996

  The Institute of Electrical Engineers of Japan

Keywords

• 大強度パルスイオンビーム蒸着法
• BaTiO₃薄膜
• 立方晶
• 多結晶薄膜
• 低温プロセス

Details

• CRID: 1390282679576273792
• NII Article ID: 130006839318
• NII Article ID: 10007791439
• NII Article ID: 10002820123
• NII Book ID: AN10136312
• DOI: 10.1541/ieejfms1990.116.8_738
• ISSN: 13475533
• ISSN: 03854205
• NDL BIB ID: 4003775
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4003775
• Web Site: https://www.jstage.jst.go.jp/article/ieejfms1990/116/8/116_8_738/_pdf
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed