In-Situ Monitoring of Film Quality during Polyclystalline Diamond Film Growth in Hot filament-Assisted CVD
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- Akiba Yukio
- Tokai University
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- Hirose Yoichi
- Tokai University
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- Kurosu Tateki
- Tokai University
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- Iida Masamori
- Tokai University
Bibliographic Information
- Other Title
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- 熱フィラメントCVD法を用いた多結晶ダイヤモンド薄膜合成中における膜質判定
- ネツ フィラメント CVDホウ オ モチイタ タケッショウ ダイヤモンド ハク
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Abstract
In-situ monitoring of film quality of the diamond film during growth by hot filament-assisted CVD method is made. The CVD diamond film including non-diamond carbon was grown under the condition where the current flows between a filament and a substrate. On the other hand, the almost pure CVD diamond film was grown under the condition where no current flows between a filament and a substrate. The intensities of thermoelectron emission and secondary electron emission from CVD diamond including non-diamond carbon are higher than those from CVD diamond films including nondiamond carbon. Defect density with lone-pair electron in CVD diamond films including nondiamond carbon was about five times higher than that of the pure CVD diamond films. It was suggested that electrons mainly emit from lone-pair electron defects on the surface of CVD diamond films including nondiamond carbon.
Journal
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- IEEJ Transactions on Fundamentals and Materials
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IEEJ Transactions on Fundamentals and Materials 117 (3), 283-288, 1997
The Institute of Electrical Engineers of Japan
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Details 詳細情報について
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- CRID
- 1390282679577299328
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- NII Article ID
- 10002821446
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- NII Book ID
- AN10136312
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- ISSN
- 13475533
- 03854205
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- NDL BIB ID
- 4149728
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed