エキシマレーザアブレーション法によるPb-Zr-Ti-O強誘電体薄膜の作製

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  • Prepararion of Ferroelectric Pb-Zr-Ti-O Thin Films by KrF Excimer Laser Ablarion Technique
  • エキシマ レーザ アブレーションホウ ニヨル Pb Zr Ti O キョウ ユ

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Pb (Zr1-x, Tix) O3 (PZT) ferroelectric thin films were prepared using the excimer laser ablarion technique. Optical emission of the PZT plasma plume was studied to understand the quantitative relation between the PZT film quality and the ablation plume plasma state. We identified the spectral lines originated in Pb, Pb+, Zr, Zr+, Ti, Ti+, O, O+, PbO, ZrO and TiO. These spectral intensities and dynamics have remarkable dependence on ambient O2 pressure. The X-ray diffraction patterns showed that the PZT films propared on MgO (100) substrate at 600°C and with a laser fluence of 2J/cm2 have a perovskite-pyrochlore mixed structure. The condition of 13Pa oxygen pressure provided high quality perovskite films. The ferroelectric properties of the Au/PZT/Pt/MgO structure were studied. The PZT perovskite structure (00l) was obtained on Pt (200)/MgO (100) substrate at 650°C. Polarizationelectric field curve for a PZT films with 200nm thickness showed a remanent polarization of 20μC/cm2 and a dielectric constant of 500.

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