RF放電プラズマによる基板の温度上昇 Temperature Rise in a Birefringent Substrate by RF Discharge Plasma

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Temperature rises of a birefringent substrate (LiNbO3) have been measured in an argon RF discharge plasma. The measurement method is based on monitoring the variation of natural birefringence with temperature by laser interferometry. Using this method, the dependence of substrate temperature rise on applied RF power and gas pressure has been investigated. The evaluation of the temperature curves shows that heat flux from the plasma towards the substrate is independent of time and temperature. The magnitude of the flux differs largely from the applied power, and approximately 0.4‰ of the power. By measuring electron density, electron temperature and plasma potential with Langmuir probe, the energy of the ions incident on the substrate is estimated. The ion flux towards the substrate is calculated from the energy of ions and is compared with the measured heat flux. The dependence on the applied power is in approximate agreement between those fluxes. The temperature distribution over the substrate thickness is simulated numerically using the finite difference method.

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  • 電気学会論文誌. A, 基礎・材料・共通部門誌 = The transactions of the Institute of Electrical Engineers of Japan. A, A publication of Fundamentals and Materials Society  

    電気学会論文誌. A, 基礎・材料・共通部門誌 = The transactions of the Institute of Electrical Engineers of Japan. A, A publication of Fundamentals and Materials Society 117(11), 1077-1082, 1997-11 

    電気学会

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各種コード

  • NII論文ID(NAID)
    10002823005
  • NII書誌ID(NCID)
    AN10136312
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    03854205
  • NDL 記事登録ID
    4323885
  • NDL 雑誌分類
    ZN31(科学技術--電気工学・電気機械工業)
  • NDL 請求記号
    Z16-793
  • データ提供元
    CJP書誌  CJP引用  NDL  IR 
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