Electrical properties of very thin Al_2O_3 films prepared by magnetron sputtering enhanced with an inductively coupled rf plasma. (II)

• MORITA T.

  Tsukuba Institute for Super Materials, ULVAC JAPAN, Ltd.

• YAMAMOTO T.

  Tsukuba Institute for Super Materials, ULVAC JAPAN, Ltd.

• KURAUCHI T.

  Tsukuba Institute for Super Materials, ULVAC JAPAN, Ltd.

• MATSUURA M.

  Tsukuba Institute for Super Materials, ULVAC JAPAN, Ltd.

Bibliographic Information

Other Title

• 誘導結合rfプラズマ支援マグネトロンスパッタ法によるアルミナ膜の電気特性(II)

Journal

• 日本応用磁気学会学術講演概要集 = Digest of ... annual conference on magnetics in Japan

  日本応用磁気学会学術講演概要集 = Digest of ... annual conference on magnetics in Japan 22 82-, 1998-09-01

Details

• CRID: 1571135649057211520
• NII Article ID: 10002824109
• NII Book ID: AN10269644
• Text Lang: ja
• Data Source:
  • CiNii Articles