Effect of Interface Stress on Co-Ni Film Layer Electrodeposited on Amorphous Ribbon, by Heat-treatment
-
- MARUYAMA K.
- Tokyo Institute of Technology
-
- SATO T.
- Tokyo Institute of Technology
-
- NUMATA H.
- Tokyo Institute of Technology
-
- NITTONO O.
- Tokyo Institute of Technology
Bibliographic Information
- Other Title
-
- 非晶質薄帯上に電析したCo-Ni層への熱処理による界面応力の効果
Search this article
Journal
-
- 日本応用磁気学会学術講演概要集 = Digest of ... annual conference on magnetics in Japan
-
日本応用磁気学会学術講演概要集 = Digest of ... annual conference on magnetics in Japan 22 382-, 1998-09-01
- Tweet
Details 詳細情報について
-
- CRID
- 1571417124033861760
-
- NII Article ID
- 10002824884
-
- NII Book ID
- AN10269644
-
- Text Lang
- ja
-
- Data Source
-
- CiNii Articles