Adsorption Mechanisms of Organic Compounds on Si Wafer Surface by Cleanroom moisture

• KAGI Naoki

  Tokyo Institute of Technology

• FUJII Shuji

  Tokyo Institute of Technology

• YUASA Kazuhiro

  Tokyo Institute of Technology

• YABUMOTO Norikuni

  NTT Advanced Technology

• TANAKA Katsumasa

  Fujita Corporation

Bibliographic Information

Other Title

• クリーンルーム中の水分によるSiウェハ表面の有機物質汚染の影響

Journal

• エアロゾル科学・技術研究討論会 = Symposium on Aerosol Science & Technology

  エアロゾル科学・技術研究討論会 = Symposium on Aerosol Science & Technology 15 150-152, 1998-08

Details

• CRID: 1572261548974514816
• NII Article ID: 10002846216
• NII Book ID: AA11498601
• Text Lang: ja
• Data Source:
  • CiNii Articles