放射光蛍光X線分析を用いる合成ダイヤモンドの不純物解析 Characterization of Impurities in Synthetic Diamonds by Using Synchrotron Radiation X-ray Fluorescence Analysis

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抄録

Trace impurities in synthetic diamonds are characterized by using a scanning x-ray microprobe with synchrotron radiation. The diamond crystals analyzed were grown under high pressure and high temperature with the various metalic solvents. Utilizing synchrotron radiation (SR) x-ray fluorescence (XRF) analysis, concentrations of trace impurities down to 0. 1 ppm can be evaluated. Moreover, the x-ray energy dependence of XRF yield around the absorption edge shows the near-edge x-ray absorption fine structure of the trace impurities, which provides chemical-state information on the trace impurities in the diamond crystal. The future expectation of analytical capability with the next generation synchrotron light source is also described.

収録刊行物

  • 高圧力の科学と技術 = The Review of high pressure science and technology  

    高圧力の科学と技術 = The Review of high pressure science and technology 8(3), 147-154, 1998-08-20 

    The Japan Society of High Pressure Science and Technology

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各種コード

  • NII論文ID(NAID)
    10002849201
  • NII書誌ID(NCID)
    AN10452913
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    0917639X
  • NDL 記事登録ID
    4546290
  • NDL 雑誌分類
    ZP1(科学技術--化学・化学工業)
  • NDL 請求記号
    Z17-1589
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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