Resistless photo etching of SiO_2 with deoxidized reaction and self growing of resist film

• NAKADA K.

  TOKAI Univ.

• MORI T.

  TOKAI Univ.

• MOCHIZUKI M.

  TOKAI Univ.

• MURAHARA M.

  TOKAI Univ.

Bibliographic Information

Other Title

• 酸素引き抜き反応と保護膜形成反応を同時進行させたSiO_2のレジストレス光エッチング

Journal

• レーザー学会学術講演会年次大会講演予稿集 = Annual meeting, of the Laser Society of Japan digest of technical papers

  レーザー学会学術講演会年次大会講演予稿集 = Annual meeting, of the Laser Society of Japan digest of technical papers 18 179-, 1998-01-01

Details

• CRID: 1571698599007154688
• NII Article ID: 10002882950
• NII Book ID: AA11604265
• ISSN: 09136355
• Text Lang: ja
• Data Source:
  • CiNii Articles