シアーセル法によるゲルマニウム半導体融液の高精度拡散係数測定技術の開発

Bibliographic Information

Other Title
  • Technological Development of highly accurate Diffusion Coefficient Measurement by Shear Cell Method in Germanium Semiconductor Melt

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Journal

Details 詳細情報について

  • CRID
    1573668923850397184
  • NII Article ID
    10002913877
  • NII Book ID
    AN10537663
  • ISSN
    09153616
  • Text Lang
    en
  • Data Source
    • CiNii Articles

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