Deposition and Dissolution Mechanism of Lithium on Aluminum Substrate
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- MAGAINO Shin’ichi
- Kanagawa Industrial Technology Research Institute
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- SOGA Masayasu
- Kanagawa Industrial Technology Research Institute
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- SOBUE Kazuharu
- Kanagawa Industrial Technology Research Institute
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- KAWAGUCHI Akihiro
- Kanagawa Industrial Technology Research Institute
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- MIYAZAKI Hiroshi
- Tokyo Institute of Polytechnics
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- SASAKI Yukio
- Tokyo Institute of Polytechnics
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<p>Deposition and dissolution mechanism of lithium on the aluminum substrate has been investigated by electrochemical impedance spectroscopy (EIS) and x-ray photoelectron spectroscopy (XPS). Every impedance diagram obtained during deposition and dissolution periods consists of two loops. The diameter of the high-frequency loop is almost constant regardless of the amount of deposition or dissolution, while the magnitude of the low-frequency loop decreases with increasing deposition period, and increases with increasing dissolution period. XPS results showed a surface film, which consists of an outer LiF layer and an inner LiOH-Li2O layer, forms on the Li-Al alloy. Thickness of the LiOH-Li2O layer increases with dissolution period. The mathematical analysis of a model mechanism suggests that the high-frequency loop of the impedance diagram may correspond to both the charge-transfer resistance and the resistance of the LiF layer. The low-frequency loop may comprise the diffusion process of Li+ in the LiOH-Li2O layer, the coverage relaxation of the adsorbed species Liads and Li+ ads, and the alloying process of Li-Al.</p>
収録刊行物
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- Electrochemistry
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Electrochemistry 67 (9), 903-911, 1999-09-05
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詳細情報 詳細情報について
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- CRID
- 1390001277392976640
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- NII論文ID
- 10004274121
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- NII書誌ID
- AN00151637
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- ISSN
- 21862451
- 13443542
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- NDL書誌ID
- 4827264
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用可