Microstructural Fabrication for Measuring Residual Strains of CMOS Thin Films

• CHANG Pei-Zen

  Institute of Applied Mechanics, National Taiwan University

• DAI Ching-Liang

  Department of Mechanical Engineering, Oriental Institute of Technology

収録刊行物

• International journal of the Japan Society for Precision Engineering

  International journal of the Japan Society for Precision Engineering 33 (2), 135-140, 1999-06-30

キーワード

• CMOS
• microstructure
• thin film
• residual strain
• micro strain gauge

詳細情報

• CRID: 1573105974045739904
• NII論文ID: 10004294589
• NII書誌ID: AA1080710X
• ISSN: 0916782X
• 本文言語コード: en
• データソース種別:
  • CiNii Articles