Microwave Surface Resistance of Bi₂Sr₂CaCu₂O_x Thick Films on Large-Area Metallic Substrates

• Inagaki Shigemi

  KEK, National Laboratory for High Energy Physics, 1–1 Oho, Tsukuba, Ibaraki 305, Japan

• Asano Kiyomitsu

  KEK, National Laboratory for High Energy Physics, 1–1 Oho, Tsukuba, Ibaraki 305, Japan

• Ezura Eizi

  KEK, National Laboratory for High Energy Physics, 1–1 Oho, Tsukuba, Ibaraki 305, Japan

• Haseyama Shuetsu

  Central Research Laboratory, Dowa Mining Co., Ltd., 277–1 Tobuki–cho, Hachioji, Tokyo 192, Japan

• Isagawa Shigeru

  KEK, National Laboratory for High Energy Physics, 1–1 Oho, Tsukuba, Ibaraki 305, Japan

• Liu Jian–Fei

  KEK, National Laboratory for High Energy Physics, 1–1 Oho, Tsukuba, Ibaraki 305, Japan

• Nakanishi Hiroshi

  KEK, National Laboratory for High Energy Physics, 1–1 Oho, Tsukuba, Ibaraki 305, Japan

• Yoshizawa Shuji

  Central Research Laboratory, Dowa Mining Co., Ltd., 277–1 Tobuki–cho, Hachioji, Tokyo 192, Japan

書誌事項

タイトル別名

• Microwave Surface Resistance of Bi2Sr2CaCu2Ox Thick Films on Large-Area Metallic Substrates.
• Microwave Surface Resistance of Bi2Sr2C

抄録

As a feasibility study for application of a high-T _c material to an accelerator cavity, Bi₂Sr₂CaCu₂O_x thick films were formed on large-area metallic substrates. The microwave surface resistance of the films was measured over a temperature range from 4.2 K to 300 K using a demountable cylindrical copper cavity operated at 3 GHz in the TE₀₁₁ mode. The area of the end plate was 177 cm² and the thickness of the films was around 50 µm. The films were formed either on silver foils (on copper) or on a silver plate, coated by either a screen-printing or a spray-coating method, sintered either in air or in a Bi₂O₃ atmosphere, both at 885-890^°C, and either annealed in nitrogen gas at 600^°C or not annealed. The ratio of the microwave surface resistance of the best film to that of the copper was 0.18 at 10 K and 0.65 at 77.3 K. A comparison of the microwave surface resistance is made between Bi₂Sr₂CaCu₂O_x and YBa₂Cu₃O_7-x films.

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 36 (6A), 3478-3484, 1997

  The Japan Society of Applied Physics

キーワード

• high- T <SUB> c</SUB> superconductor
• Bi<SUB> 2</SUB>Sr<SUB> 2</SUB>CaCu<SUB> 2</SUB>O<SUB> x</SUB> thick film
• screen-printing method
• spray-coating method
• accelerator cavities
• metallic substrate
• microwave surface resistance

詳細情報

• CRID: 1390001206247752576
• NII論文ID: 210000041240
• NII論文ID: 10004369572
• NII書誌ID: AA10457675
• DOI: 10.1143/jjap.36.3478
• ISSN: 13474065
• ISSN: 00214922
• NDL書誌ID: 4277663
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4277663
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.36.3478
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.36.3478/pdf
• 本文言語コード: en
• データソース種別:
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