マルチカスプ磁場閉じ込め表面波プラズマ源

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  • A Surface-Wave Plasma Source with Magnetic Multicusp Fields
  • マルチカスプ ジバ トジコメ ヒョウメンハ プラズマ ゲン

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A new-type microwave plasma source has been developed for materials processing. The plasma reactor employed a launcher of azimuthally symmetric surface waves at a frequency of 2.45 GHz and also magnetic multicusp fields around the reactor chamber walls. This configuration yielded high-density (Ne_??_1011cm-3) plasmas sustained by surface waves even at low gas pressures below 10m Torr, following easy plasma ignition by electron cyclotron resonance (ECR) discharges. Electrical and optical diagnostics were made to obtain the plasma properties in Ar. It was shown that a transition from ECR excited to surface-wave excited plasmas occurs under conditions where the plasma electron density exceeds a critical value of Ne-1×10"cm-3.

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