A Positive-Working Alkaline Developable Photoresist Based on t-Boc-Calix  resorcinarene and a Photoacid Generator
A positive working photoresist based on octa-O-tert-butyl carbonated C-hexylcalixresorcinarene (t-BOC-h-C4) and p-nitrobenzyl-9,10-dimethoxy-anthracene-2-sulfonate (NDS) as a photoacid generator has been developed. The photoresist consisting of t-BOC-h-C4 (90 wt%) and NDS (10 wt%) showed a sensitivity of 24 mJ/cm<SUP>2</SUP> and a contrast of 8.1, when it was exposed to 365 nm light and postbaked at 90°C for 2 min, followed by developing with a 1% aqueous tetramethylammonium hydroxide (TMAH) solution at room temperature.
- Chemistry letters
Chemistry letters 1998(9), 865-866, 1998-09-05
The Chemical Society of Japan