A Positive-Working Alkaline Developable Photoresist Based on t-Boc-Calix [4] resorcinarene and a Photoacid Generator

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著者

    • TAKESHI Kazumasa
    • Department of Human Sensing and Functional Sensor Engineering, Graduate School of Engineering, Yamagata University
    • NAKAYAMA Ryuji
    • Department of Human Sensing and Functional Sensor Engineering, Graduate School of Engineering, Yamagata University
    • UEDA Mitsuru
    • Department of Human Sensing and Functional Sensor Engineering, Graduate School of Engineering, Yamagata University

抄録

A positive working photoresist based on octa-O-tert-butyl carbonated C-hexylcalix[4]resorcinarene (t-BOC-h-C4) and p-nitrobenzyl-9,10-dimethoxy-anthracene-2-sulfonate (NDS) as a photoacid generator has been developed. The photoresist consisting of t-BOC-h-C4 (90 wt%) and NDS (10 wt%) showed a sensitivity of 24 mJ/cm<SUP>2</SUP> and a contrast of 8.1, when it was exposed to 365 nm light and postbaked at 90°C for 2 min, followed by developing with a 1% aqueous tetramethylammonium hydroxide (TMAH) solution at room temperature.

収録刊行物

  • Chemistry letters  

    Chemistry letters 1998(9), 865-866, 1998-09-05 

    The Chemical Society of Japan

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各種コード

  • NII論文ID(NAID)
    10004485024
  • NII書誌ID(NCID)
    AA00603318
  • 本文言語コード
    ENG
  • 資料種別
    ART
  • ISSN
    03667022
  • データ提供元
    CJP書誌  J-STAGE 
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