REACTIVE ION BEAM ETCHING (RIBE) TECHNIQUE FOR CROSS SECTIONAL SEM SPECIMEN PREPARATION OF SEMICONDUCTORS
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- ALANI R.
- Gatan R&D
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- MITRO R.J.
- Gatan R&D
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- OGURA K.
- JEOL Ltd.
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Journal
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- 電子顕微鏡
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電子顕微鏡 34 83-, 1999-05-01
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Details 詳細情報について
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- CRID
- 1570854174275441792
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- NII Article ID
- 10004538819
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- NII Book ID
- AN00145000
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- ISSN
- 04170326
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- Text Lang
- en
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- Data Source
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- CiNii Articles