In-situ high resolution TEM observation of nucleation of Si crystalline in SiO_2 layer at high temperatures

• KAMINO T.

  Hitachi Science Systems, Ltd.

• YAGUCHI T.

  Hitachi Science Systems, Ltd.

• KOBAYASHI H.

  Hitachi Ltd., Instrument Div.

• MORISAKI H.

  The University of Electro-Communications

• NOZAKI S.

  The University of Electro-Communications

• IZUMI T.

  Tokai University

• IWASE M.

  Tokai University

Bibliographic Information

Other Title

• SiO_2膜中のSiナノ結晶成長の高分解能その場観察

Journal

• 電子顕微鏡

  電子顕微鏡 34 109-, 1999-05-01

Details

• CRID: 1570291224322016640
• NII Article ID: 10004538877
• NII Book ID: AN00145000
• ISSN: 04170326
• Text Lang: ja
• Data Source:
  • CiNii Articles