原子吸光法を用いたTi-O_2マグネトロンスパッタにおけるTi原子密度測定 Measurement of Ti Atom Densities Using Atomic Absorption Method in Ti-O_2 Magnetron Sputtering
Ti atom density distributions on the radial direction in Ti-O<SUB>2</SUB> rf (13.56 MHz) magnetron sputtering were investigated by an atomic absorption method. We also measured Ti atom densities in pure Ar discharge for the comparison with that in Ar-O<SUB>2</SUB> mixture discharge. At a total pressure of 2.7 Pa and rf power of 200 W, Ti atom density in Ar-O<SUB>2</SUB> discharge was nearly two order smaller than that of metallic mode. The maximum value of atom density for radial distance was obtained at the vicinity of the inside of the location with maximum transverse magnetic field strength (r= 30 mm) for all experimental conditions. Dependence of Ti atom density distributions on total pressure of Ar-O<SUB>2</SUB> gases and axial distance were demonstrated.
真空 43(3), 197-200, 2000-03-20
The Vacuum Society of Japan