試料導入室における試料汚染要因

• 黒河 明

  電子技術総合研究所

• 一村 信吾

  電子技術総合研究所

• 中村 健

  電子技術総合研究所

• 井藤 浩志

  電子技術総合研究所

書誌事項

タイトル別名

• Origins of Sample-Surface Contaminants in Loadlock Chamber.
• シリョウ ドウニュウシツ ニ オケル シリョウ オセン ヨウイン

抄録

The sample contamination in a loadlock chamber, caused by particle sticking, adsorption of gas and moisture in a loadlock chamber and back stream from pumping systems, was investigated. In order to eliminate the first two sources of contamination, a clean silicon sample was prepared in a glove box filled with particle-free nitrogen gas, and the sample was transferred to the loadlock chamber without exposing to air. To observe the contamination during pumping, the last source of contamination, a clean sample was set in the loadlock chamber and after evacuation surface contaminant was evaluated by C1s intensity of XPS spectra. Several evacuation procedures were compared and we concluded that oil-free pumping system is essentially important for contaminant-free introduction of a clean sample.

収録刊行物

• 真空

  真空 43 (3), 247-250, 2000

  一般社団法人 日本真空学会

キーワード

• Electrical and Electronic Engineering
• Surfaces, Coatings and Films
• Condensed Matter Physics

詳細情報

• CRID: 1390001204063747712
• NII論文ID: 10004561609
• NII書誌ID: AN00119871
• DOI: 10.3131/jvsj.43.247
• ISSN: 18809413
• ISSN: 05598516
• NDL書誌ID: 5360912
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I5360912
• 本文言語コード: ja
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可