Xe_2エキシマーランプを用いた有機シリコン原料の気相における光分解 [in Japanese] Photochemical Dissociation of Organic Silicon Source using Xe_2 Excimer Lamp in Gas Phase [in Japanese]
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Photochemical dissociation of Tetraethoxysilane (TEOS) used as an organic silicon source in the gas phase was investigated by in-situ mass spectrometry. The vacuum uliraviolet (VUV) sources for inducing photochemical reaction were Xe<SUB>2</SUB> excimer lamp (172 nm : 7.2 eV) and Hg lamp (185 nm : 6.5 eV). TEOS was dissociated by irradiation of VUV in the gas phase, while releasing alkyl groups such as C<SUB>x</SUB>H<SUB>y</SUB> (x= 1-2, y=2-5). Moreover, almost all Si-O bonds of TEOS were not broken at the energy of Xe<SUB>2</SUB> excimer light. It has been found that the species produced by photochemical reaction in the gas phase have long lifetime of at least more than 2 minutes. Finally, the film deposited on the MgF<SUB>2</SUB> window has strong light absorption from visible to ultraviolet region, because the film contains organic compounds.
- Journal of the Vacuum Society of Japan
Journal of the Vacuum Society of Japan 43(3), 288-291, 2000-03-20
The Vacuum Society of Japan