レーザーアブレーションによる有機ケイ素高分子薄膜の作製と評価 Preparation and Estimation of Thin Films From Organosilicon-based Polymers by a Laser Ablation Method

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We prepared thin films from poly (methylphenilsilane) (PMPS) and poly (dimethylsilane) (PDMS) by eximer-laser ablation and characterized them as light-emitting material for electroluminescence. The deposited films were characterized by UV, PL (photoluminescence) and FT-IR spectra, and the changes of the targets were examined by PL spectra. The FT-IR spectra of the deposited PDMS films showed that irradiation of PDMS targets at high pulse frequency (100 Hz) gave films that contained very small amount of Si-H groups, meaning that films of the similar chemical composition as the original PDMS were successfully produced. The deposited films that exhibit PL emission around 360 nm at room temperature were obtained from both of the polysilanes. The I-V curve for a LED based on a PDMS films is reported, while its EL emission has not observed yet.

収録刊行物

  • 真空  

    真空 43(3), 373-376, 2000-03-20 

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10004561863
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    05598516
  • NDL 記事登録ID
    5361663
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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