Xe/Ag(111)の層成長における構造変化 Lateral Compression of a Xe Film Physisorbed on Ag(111)

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The layering transition of a physisorption system on a metal single crystal has been investigated by means of an ellipsometry and an eXtremely-low-current LEED (XLEED). Our XLEED system is operated at the primary electron current of about 0.1 pA, which minimizes the effect of desorption, defect formation, and charging. We observed the surface structure of Xe/Ag (111) by XLEED while monitoring the layer growth by the ellipsometry from a submonolayer film to a thick one. An equilibrium between the Xe film and coexisting three-dimensional Xe gas has been maintained throughout the experiment. From a monolayer film to a sufficiently thick film, the Xe overlayer has clear hexagonal structure whose directions of the unit vectors are coincident with those of the substrate. The Xe-Xe spacing in the monolayer film on Ag (111) is known to be a few per cent larger than that of bulk. Our interest is how the Xe-Xe spacing varies in the process of layer growth. We have made a systematic observation of the change of the Xe-Xe spacing in one and two monolayer films at pressures between 10<SUP>-7</SUP> and 10<SUP>-2</SUP> Pa and at temperatures between 50 and 100 K.

収録刊行物

  • 真空  

    真空 43(4), 492-498, 2000-04-20 

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10004562141
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    05598516
  • NDL 記事登録ID
    5367357
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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