加速器用の極低温実用表面における水素吸着 Adsorption and Desorption Measurements of Hydrogen on Technical Surfaces for Accelerator Use

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Saturation coverages and adsorption energies of hydrogen molecules adsorbed at 4.2 K were investigated for several technical surfaces of an anodized aluminum, an electroplated copper coating and a sputtered TiZrV coating. From the result of adsorption isotherm measurements, the adsorbing molecules amount saturates in one monolayer, or two, on the smooth surfaces of the Cu and TiZrV coatings, while the adsorption capacity in the porous surface of the anodized aluminum is several tens times large. Thermal desorption spectra show the peak corresponding to the adsorption energy of about 20 meV for all the materials. In the anodized aluminum surface, when cleaned by baking, the additional sites with higher adsorption energies of 70 and 80 meV are observed. Hydrogen molecules adsorbs first in these sites, then forming an adlayer with the adsorption energy of 20 meV.

収録刊行物

  • 真空

    真空 43(4), 499-503, 2000-04-20

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10004562164
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    05598516
  • NDL 記事登録ID
    5367367
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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