Plasma Enhanced Chemical Vapor Deposition of Interlayer Films Having a Low Dielectric Constant

• SHIRAFUJI Tatsuru

  Department of Electronics and Information Science, Kyoto Institute of Technology

• HAYASHI Yasuaki

  Department of Electronics and Information Science, Kyoto Institute of Technology

• NISHINO Shigehiro

  Department of Electronics and Information Science, Kyoto Institute of Technology

Bibliographic Information

Other Title

• 低誘電率層間絶縁膜のプラズマ化学気相堆積
• テイユウドウリツソウ カン ゼツエン マク ノ プラズマ カガク キソウ タイセキ

Journal

• Shinku

  Shinku 43 (4), 504-511, 2000

  The Vacuum Society of Japan

Keywords

• Electrical and Electronic Engineering
• Surfaces, Coatings and Films
• Condensed Matter Physics

Details

• CRID: 1390001204064330880
• NII Article ID: 10004562175
• NII Book ID: AN00119871
• DOI: 10.3131/jvsj.43.504
• ISSN: 18809413
• ISSN: 05598516
• NDL BIB ID: 5367384
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I5367384
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles