Orientation Control of Potassium Niobate Thin Film Prepared by Sputtering.
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- HASHIMA Hidekazu
- Graduate School of Science and Technology, Kobe University
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- KONISHI Akio
- New Glass Research Center, Nihon Yamamura Glass Co., Ltd.
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- WAKABAYASHI Hajimu
- New Glass Research Center, Nihon Yamamura Glass Co., Ltd.
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- KAWAMOTO Yoji
- Graduate School of Science and Technology, Kobe University
Bibliographic Information
- Other Title
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- スパッタ法によるニオブ酸カリウム薄膜の配向性制御
- スパッタホウ ニ ヨル ニオブサン カリウム ハクマク ノ ハイコウセイ セイギョ
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Abstract
Potassium niobate thin films were prepared on amorphous (SrO-SiO2) layer/Si wafer by means of RF magnetron sputtering using a (KNbO3+ K2CO3) mixed powder target. Amorphous (SrO-SiO2) layers under the potassium niobate thin films were prepared by means of RF magnetron sputtering using a (SrCO3 + SiO2) mixed powder target. Crystallization and orientation of the potassium niobate thin films depended on (KNbO3 + K2CO3) target compositions and amorphous (SrO-SiO2) layer target compositions under the potassium niobate thin films. The orientation of potassium niobate thin films could be controlled by a favorable choice of (KNbO3 + K2CO3) target compositions and amorphous (SrO-SiO2) layer target compositions, and produced highly [110] oriented perovskite type potassium niobate thin films.
Journal
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- Shinku
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Shinku 42 (5), 581-584, 1999
The Vacuum Society of Japan
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Keywords
Details
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- CRID
- 1390001204065812480
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- NII Article ID
- 10004568012
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- NII Book ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL BIB ID
- 4761237
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed