真空蒸着によるCdS(Cu)/CdS薄膜光電池の作成と効率の基板温度依存性 [in Japanese] Fabrication of CdS(Cu)/CdS Thin-Film Photovoltaic Cells by Vacuum Deposition Process and Substrate Temperature Dependence of the Efficiency [in Japanese]
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Thin-film photovoltaic cells composed of Cu-doped CdS and non-doped CdS layers (SnO<SUB>2</SUB>/CdS (Cu) /CdS/A1) have been fabricated by an all vacuum deposition process. First, thin Cu film (about 10 nm thick) was deposited on the SnO<SUB>2</SUB> coated glass substrate followed by the deposition of CdS<SUB>I</SUB> layer (about 500 nm thick). These layers were annealed in a vacuum at 350°C for 15 min. before the deposition of CdS<SUB>II</SUB> layer (about 4 pm thick). The substrate temperature was lowered from 200°C to 130°C and held at 130°C during deposition of CdS<SUB>II</SUB> layer. This process was most important to get efficient cells. Finally, Al film was deposited on the CdS<SUB>II</SUB> layer as a counter electrode. The conversion efficiency of the best cell was over 7%. Depth profiles measured by SIMS showed that the Cu diffused into CdS<SUB>II</SUB> layer through CdSI layer and the diffusion of Cu slowed down drastically at a substrate temperature of about 140°C and stopped at about 130°C. As a result, the boundary between the Cu-doped p-type CdS layer and non-doped CdS layer was formed in the CdS<SUB>II</SUB> layer. The spectral responses of the short-circuit current of the cells were mainly dominated by the band gap energy and Cu impurity levels in CdS. Therefore, we concluded that the photovoltaic effect of the cells was caused by the p-i-n or p-n homojunction of CdS.
- Journal of the Vacuum Society of Japan
Journal of the Vacuum Society of Japan 42(6), 613-619, 1999-06-20
The Vacuum Society of Japan