ホローカソード直流CF_4プラズマ中のCF_3, CF_2ラジカル密度計測 Measurement of CF_3 and CF_2 Radical Densities in a Hollow Cathode DC DF_4 Plasma
Neutral CF<SUB>3</SUB> and CF<SUB>2</SUB> radicals in a hollow cathode DC CF<SUB>4</SUB> discharge were first detected with a quadrupole mass spectrometer, using the threshold ionization technique. At CF<SUB>4</SUB> pressure of 27 Pa, the densities of both radicals were measured as a function of discharge current over a range of 20-50 mA. CF<SUB>4</SUB> pressure dependences of these radical densities were also measured over a CF4 pressure range of 27-80 Pa. The results showed that the CF<SUB>3</SUB> and CF<SUB>2</SUB> radical densities increased with discharge current. The CF<SUB>3</SUB> radical density increased with CF<SUB>4</SUB> pressure. On the other hand, the CF<SUB>2</SUB> radical density increased up to 40 Pa and then tended to be decrease.
真空 42(7), 647-651, 1999-07-20
The Vacuum Society of Japan