ホローカソード直流CF_4プラズマ中のCF_3, CF_2ラジカル密度計測 Measurement of CF_3 and CF_2 Radical Densities in a Hollow Cathode DC DF_4 Plasma

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著者

    • 藤岡 寛之 FUJIOKA Hiroyuki
    • 神奈川工科大学電気電子工学科 Department of Electrical and Electronic Engineering, Kanagawa Institute of Technology
    • 真篠 聡一 MASHINO Souichi
    • 神奈川工科大学電気電子工学科 Department of Electrical and Electronic Engineering, Kanagawa Institute of Technology
    • 愛敬 仁 [他] AIKYO Satoshi
    • 神奈川工科大学電気電子工学科 Department of Electrical and Electronic Engineering, Kanagawa Institute of Technology
    • 後藤 みき GOTO Miki
    • 神奈川工科大学電気電子工学科 Department of Electrical and Electronic Engineering, Kanagawa Institute of Technology
    • 荒井 俊彦 ARAI Toshihiko
    • 神奈川工科大学電気電子工学科 Department of Electrical and Electronic Engineering, Kanagawa Institute of Technology

抄録

Neutral CF<SUB>3</SUB> and CF<SUB>2</SUB> radicals in a hollow cathode DC CF<SUB>4</SUB> discharge were first detected with a quadrupole mass spectrometer, using the threshold ionization technique. At CF<SUB>4</SUB> pressure of 27 Pa, the densities of both radicals were measured as a function of discharge current over a range of 20-50 mA. CF<SUB>4</SUB> pressure dependences of these radical densities were also measured over a CF4 pressure range of 27-80 Pa. The results showed that the CF<SUB>3</SUB> and CF<SUB>2</SUB> radical densities increased with discharge current. The CF<SUB>3</SUB> radical density increased with CF<SUB>4</SUB> pressure. On the other hand, the CF<SUB>2</SUB> radical density increased up to 40 Pa and then tended to be decrease.

収録刊行物

  • 真空  

    真空 42(7), 647-651, 1999-07-20 

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10004568112
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    05598516
  • NDL 記事登録ID
    4799953
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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