Measurement of CF3 and CF2 Radical Densities in a Hollow Cathode DC CF4 Plasma.

DOI Web Site 12 References
  • FUJIOKA Hiroyuki
    Department of Electrical and Electronic Engineering, Kanagawa Institute of Technology
  • MASHINO Souichi
    Department of Electrical and Electronic Engineering, Kanagawa Institute of Technology
  • AIKYO Satoshi
    Department of Electrical and Electronic Engineering, Kanagawa Institute of Technology
  • GOTO Miki
    Department of Electrical and Electronic Engineering, Kanagawa Institute of Technology
  • ARAI Toshihiko
    Department of Electrical and Electronic Engineering, Kanagawa Institute of Technology

Bibliographic Information

Other Title
  • ホローカソード直流ＣＦ４プラズマ中のＣＦ３，ＣＦ２ラジカル密度計測
  • ホロー カソード チョクリュウ CF4 プラズマ チュウ ノ CF3 CF2 ラジカル ミツド ケイソク

Search this article

Abstract

Neutral CF3 and CF2 radicals in a hollow cathode DC CF4 discharge were first detected with a quadrupole mass spectrometer, using the threshold ionization technique. At CF4 pressure of 27 Pa, the densities of both radicals were measured as a function of discharge current over a range of 20-50 mA. CF4 pressure dependences of these radical densities were also measured over a CF4 pressure range of 27-80 Pa. The results showed that the CF3 and CF2 radical densities increased with discharge current. The CF3 radical density increased with CF4 pressure. On the other hand, the CF2 radical density increased up to 40 Pa and then tended to be decrease.

Journal

  • Shinku

    Shinku 42 (7), 647-651, 1999

    The Vacuum Society of Japan

References(12)*help

See more

Keywords

Details 詳細情報について

Report a problem

Back to top