組成変調したTi-TiN多層薄膜における高強度化機構 Hardening Mechanism of Compositionally Modulated Ti-TiN Multilayer Films

この論文にアクセスする

この論文をさがす

著者

抄録

Crystal structure, dynamic hardness and internal stress of compositionally modulated Ti-TiN multilayer films were examined in order to discuss the mechanism of hardness enhancement by compositional modulation. The hardness of the films showed a sharp peak at10 nm and was larger than that of a monolithic TiN film. XRD patterns of the films with short modulation periods showed peaks assigned to TiN single phase. With increasing the modulation period to 20 nm, XRD peaks assigned to TiN phase were broadened and weakened. Further increasing the period, broad peaks assigned to Ti were emerged. Compressive stress, which causes the films hardened, was observed in monolithic Ti and TiN, and compositionally modulated Ti-TiN films. Energy dissipated ratio defined as the ratio of dissipated energy to applied energy showed the minimum at the modulation period of 10 nm, indicating that plastic component of the deformation energy decreased. Reduction of the plastic component at the modulation period of 10 nm was in good agreement with results obtained by the hardness measurement. Decreasing of the plastic component strongly suggests that TiN layers, which has a high elastic modulus, plays an important part in the plastic deformation of the films at short modulation period.

収録刊行物

  • 真空  

    真空 42(7), 657-662, 1999-07-20 

    The Vacuum Society of Japan

参考文献:  15件

参考文献を見るにはログインが必要です。ユーザIDをお持ちでない方は新規登録してください。

各種コード

  • NII論文ID(NAID)
    10004568140
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    05598516
  • NDL 記事登録ID
    4799967
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
ページトップへ