ストレート型のWカソード使用による中空陰極法のコーティング条件とTiN膜質 [in Japanese] Hollow Cathode Discharge Coating Conditions and Properties of TiN Films with Straight-type W Cathode [in Japanese]
Access this Article
Search this Article
In order to clarify the influence of the W cathode in the hollow cathode discharge (HCD) method, straight-type W, W+Ta, and Ta cathodes were investigated using a horizontal-type high-current HCD apparatus, and HCD coating conditions and properties of TiN film with these cathodes were evaluated.<BR>(1) The life time of the W+Ta cathode during HCD plasma coating was 3-4 times as long as that of the Ta cathode.<BR>(2) Thin-film X-ray diffraction of TiN films using W and W+Ta cathodes manifested a stronger (111) peak of TiN than that of the Ta cathode.<BR>(3) Although no clear difference in the scanning electron microscopic observation of the TiN was observed, color monitoring of the TiN films with the W+Ta cathode showed a dark gold.
- Journal of the Vacuum Society of Japan
Journal of the Vacuum Society of Japan 42(7), 676-679, 1999-07-20
The Vacuum Society of Japan