Diamond Film Formation by OH Radical Injection from Remote Microwave H2/H2O Plasma into Parallel-Plate RF Methanol Plasma.

• Ikeda Masanobu

  Department of Quantum Engineering, School of Engineering, Nagoya University, Chikusa–ku, Nagoya 464–01, Japan

• Mizuno Etsuko

  Department of Electrical and Electronic Engineering, Faculty of Science and Technology, Meijo University, Tempaku–ku, Nagoya 468, Japan

• Hori Masaru

  Department of Quantum Engineering, School of Engineering, Nagoya University, Chikusa–ku, Nagoya 464–01, Japan

• Goto Toshio

  Department of Quantum Engineering, School of Engineering, Nagoya University, Chikusa–ku, Nagoya 464–01, Japan

• Yamada Koji

  Department of Electrical and Electronic Engineering, Faculty of Science and Technology, Meijo University, Tempaku–ku, Nagoya 468, Japan

• Hiramatsu Mineo

  Department of Electrical and Electronic Engineering, Faculty of Science and Technology, Meijo University, Tempaku–ku, Nagoya 468, Japan

• Nawata Masahito

  Department of Electrical and Electronic Engineering, Faculty of Science and Technology, Meijo University, Tempaku–ku, Nagoya 468, Japan

Bibliographic Information

Other Title

• Diamond Film Formation by OH Radical In
• Diamond Film Formation by OH Radical Injection from Remote Microwave H₂/H₂O Plasma into Parallel-Plate RF Methanol Plasma

Abstract

Diamond film was successfully synthesized for the first time using a parallel-plate radio-frequency (RF 13.56 MHz) methanol ( CH₃OH) plasma assisted by injection of hydrogen (H) and hydroxyl (OH) radicals generated by microwave H₂/ H₂O plasma. OH radical, in addition to H radical, injection into RF CH₃OH plasma enhanced selective diamond growth and selective etching of the nondiamond phase. The effects of OH radical injection on the initial and growth stages of the diamond formation were investigated by changing H₂O partial pressure in the microwave plasma. It was found that OH radical injection into RF CH₃OH plasma enhanced the growth of diamond in the initial stage.

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 35 (9A), 4826-4832, 1996

  The Japan Society of Applied Physics

Keywords

• diamond film
• RF methanol plasma
• microwave H<SUB> 2</SUB>/ H<SUB> 2</SUB>O plasma
• H radical
• OH radical

Details

• CRID: 1390001206250113664
• NII Article ID: 10004613611
• NII Article ID: 130004522829
• NII Article ID: 210000039704
• NII Book ID: AA10457675
• DOI: 10.1143/jjap.35.4826
• ISSN: 13474065
• ISSN: 00214922
• NDL BIB ID: 4060177
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4060177
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.35.4826
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.35.4826/pdf
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed