Temperature-Corrected Quartz-Crystal Microbalance for Real-Time Film Thickness Monitoring in Vacuum Evaporation

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抄録

For a quartz-crystal microbalance system without thermocouples for monitoring thin film thickness, a computational method which corrects for the temperature variation in the quartz crystal is presented. This correction method eliminates the need for pipes and electrical wires, simplifying the conventional system. To avoid the use of electrical wires, both a laser diode and a microlens were used to transmit the signal of the change of resonant frequency of the quartz crystal. Using a 4.2 MHz resonant AT-cut quartz-crystal plate, the error in the measurement of Ti film thickness was <3.0% under the conditions of deposition time <230 s and the quartz-crystal temperature <160° C.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes  

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 35(9A), 4833-4838, 1996-09-15 

    Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyo

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各種コード

  • NII論文ID(NAID)
    10004613635
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    ART
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    4060178
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  JSAP 
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