Internal stress of cubic boron nitride thin films prepared by reactive sputtering

• KANAI Kumiko

  Graduate School of Engineering, Osaka University

• WAKATSUCHI Masayuki

  Graduate School of Engineering, Osaka University

• UEDA Yoshio

  Graduate School of Engineering, Osaka University

• NISHIKAWA Masahiro

  Graduate School of Engineering, Osaka University

Bibliographic Information

Other Title

• 反応性スパッタリング法により作成した立方晶窒化硼素薄膜の内部応力

Journal

• 高温学会誌

  高温学会誌 25 (4), 6-, 1999-07-20

Details

• CRID: 1571417124199038208
• NII Article ID: 10004659582
• NII Book ID: AN00080051
• ISSN: 03871096
• Text Lang: ja
• Data Source:
  • CiNii Articles