挿入光源(BL10XU)と第3世代XAFS -高輝度光源のもたらす新世界- Third Generation XAFS Using Tunable X-Ray Undulator at BL10XU of Spring-8 -Another Paradime with High Brilliance Photon Source-

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We report on the initial test of undulator tuning for the beamline BL10XU at Spring-8. The optics of BL10XU is quite simple, i.e., major optical components are a rotated-inclined double crystal monochromator designed by Ishikawa and a double flat mirror. One of a standard in-vacuum type undulator (U032V) is used. Since a typical energy range of - 1 keV is required as a routine EXAFS scan, both monochromator and undulator gap should be controlled during a scan; an undulator gap is varied so that a monochromator acceptance can track the undulator peak. On varying an undulator gap from 9.6 mm to 22 mm, a wide energy range (5-30 keV) is covered. We demonstrate that undulator tuning can provide glitch-free transmission spectra with a high energy resolution (1.5 eV at 9 keV) .

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  • 日本結晶学会誌  

    日本結晶学会誌 42(1), 41-50, 2000-02-29 

    The Crystallographic Society of Japan

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各種コード

  • NII論文ID(NAID)
    10004673101
  • NII書誌ID(NCID)
    AN00188364
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    03694585
  • NDL 記事登録ID
    5333431
  • NDL 雑誌分類
    ZM46(科学技術--地球科学--岩石・鉱物・鉱床)
  • NDL 請求記号
    Z15-138
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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