Strong Basic Sites Accelerate the Deactivation of Oxide Catalysts Supported on FSM-16 for the Vapor-Phase Beckmann Rearrangement of Cyclohexanone Oxime

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著者

    • SHOURO Daisuke
    • Department of Chemistry and Material Engineering, Faculty of Engineering, Shinshu University
    • NAKAJIMA Tsuyoshi
    • Department of Chemistry and Material Engineering, Faculty of Engineering, Shinshu University
    • MISHIMA Shozi
    • Department of Chemistry and Material Engineering, Faculty of Engineering, Shinshu University

抄録

The acidic and basic properties of FSM-16-supported Al<SUB>2</SUB>O<SUB>3</SUB>, ZnO or CdO were determined by the temperature-programmed desorption (TPD) of ethylamine. Relationship of the deactivation rate of the catalyst during the vapor-phase Beckmann rearrangement with the acidic and basic properties was studied. It was found that the deactivation was accelerated with an increase in the amount of the strong basic sites.

収録刊行物

  • Chemistry letters  

    Chemistry letters 1999(12), 1319-1320, 1999-12-05 

    The Chemical Society of Japan

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各種コード

  • NII論文ID(NAID)
    10004704253
  • NII書誌ID(NCID)
    AA00603318
  • 本文言語コード
    ENG
  • 資料種別
    OTR
  • ISSN
    03667022
  • データ提供元
    CJP書誌  J-STAGE 
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