TiNi形状記憶合金薄膜の加工法 [in Japanese] A Study on Patterning Method of TiNi Shape Memory Thin Film [in Japanese]
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To realize simple and powerful micro actuators, we have developed a new patterning method of TiNi shape memory alloy (SMA) thin films. This method supplies us attractive SMA micro structures from the viewpoint of aspect ratio. In the fabrication, we applied a lift-off process with a thick polymide mold layer and patterned a high aspect ratio SMA structure. The reason why we apply the lift-off process is that the structure's inner stress is lower than that obtained by wet or dry etching processes. By using this method, we have patterned structures of 20μ<i>m</i> in width and 10μ<i>m</i> in height. The aspect ratio of this structure is 0.5. The patterning accuracy is about 4μ<i>m</i>. This process is useful to realize SMA micro actuators of TiNi thin films.
- The Journal of the Institute of Electrical Engineers of Japan
The Journal of the Institute of Electrical Engineers of Japan 117(1), 27-32, 1997-01
The Institute of Electrical Engineers of Japan