Deposition Thickness Sensor for Ion Sputtering Apparatus.
-
- Kumazaki Hironori
- Gifu National College of Technology
-
- Inaba Seiki
- Gifu National College of Technology
-
- Hane Kazuhiro
- Tohoku University
Bibliographic Information
- Other Title
-
- Deposition Thickness Sensor for Ion Spu
Search this article
Abstract
A quartz core microcantilever fabricated from an optical fiber tip can be utilized for monitoring of deposition thickness. Dynamic monitoring of deposition thickness was performed without influence of electrical noise in an ion sputtering apparatus. Resonance frequencies were measured as a function of deposition time of Au and Ag. Resonance frequency decreased from 11.52kHz to 10.89kHz during a deposition time of 60 minutes which corresponded to a thickness of 360nm in case of Au.
Journal
-
- IEEJ Transactions on Sensors and Micromachines
-
IEEJ Transactions on Sensors and Micromachines 117 (2), 105-108, 1997
The Institute of Electrical Engineers of Japan
- Tweet
Keywords
Details
-
- CRID
- 1390282679437984768
-
- NII Article ID
- 10004832000
-
- NII Book ID
- AN1052634X
-
- ISSN
- 13475525
- 13418939
-
- NDL BIB ID
- 4128890
-
- Text Lang
- en
-
- Data Source
-
- JaLC
- NDL
- Crossref
- CiNii Articles
-
- Abstract License Flag
- Disallowed